Mask blank for EUV exposure and mask for EUV exposure

Details Mask blank for EUV exposure and mask for EUV exposure Mask blank for EUV exposure and mask for EUV exposure

2011-05-03

2011-05-03

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S430000

Reexamination Certificate

active

07935460

ABSTRACT:
Provided are a mask for EUV exposure and a mask blank for EUV exposure for manufacturing the same, so as to improve the contrast of ultraviolet inspection light and improve the inspection performance for the mask. This mask blank for EUV exposure includes a substrate, a reflecting layer which is provided on the substrate and reflects EUV light, and an absorbent layer which is provided on the reflecting layer and absorbs EUV light. Reflectance of light at a wavelength between 150 nm and 300 nm is greater at the absorbent layer than that of the reflecting layer. The mask for EUV exposure can be manufactured by processing this mask blank for EUV exposure.

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patent: WO 2005/050719 (2005-06-01), None

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