Mask blank and method of producing mask

Details Mask blank and method of producing mask Mask blank and method of producing mask

1997-11-25

2000-12-19

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, 378 35, 428433, G03F 900

Patent

active

061625647

ABSTRACT:
A shading film of chrome is formed entirely on one surface of a circular substrate of quartz. The substrate is rotated and resist is applied to the shading film. Since the substrate is shaped in a circle, the resist spreads uniformly on the entire surface of the shading film by the centrifugal force. Therefore, the resist has a substantially uniform film thickness over almost the entire surface of the shading film. This resist is patterned to form a resist pattern. By etching the shading film with the resist pattern used as a mask, a pattern preferable in accuracy of dimensions can be formed.

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