Mask and substrate alignment for solder bump process

Semiconductor device manufacturing: process – Miscellaneous

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07410919

ABSTRACT:
A system for of aligning a mask to a substrate comprising: a fixture for holding the mask and the substrate in fixed positions relative to each other; means for holding the substrate, the means for holding the substrate protruding through openings in a table and the fixture, the means for holding fixedly mounted on a stage, the stage moveable in first and second directions and rotatable about an axis relative to the table; means for affixing the fixture containing the mask and the substrate to the table; means for controlling the means for temporarily affixing so as to generate a uniform force around a perimeter of the fixture to effectuate the temporarily affixing; means for aligning the mask to the substrate, the means for aligning controlling movement of the stage in the first and second directions and rotation about the axis; and means for fastening the fixture together.

REFERENCES:
patent: 3499714 (1970-03-01), Schellenberg
patent: 3516386 (1970-06-01), Schindler et al.
patent: 3647533 (1972-03-01), Hicks
patent: 3669060 (1972-06-01), Page et al.
patent: 4544311 (1985-10-01), Husain
patent: 4746548 (1988-05-01), Boudreau et al.
patent: 4755053 (1988-07-01), Levinson et al.
patent: 4915057 (1990-04-01), Boudreau et al.
patent: 5296916 (1994-03-01), Kelly et al.
patent: 5324012 (1994-06-01), Aoyama et al.
patent: 6030889 (2000-02-01), Aulicino et al.
patent: 6198525 (2001-03-01), Barringer et al.
patent: 6274198 (2001-08-01), Dautartas
patent: 6327034 (2001-12-01), Hoover et al.
patent: 2001/0030747 (2001-10-01), Hoover et al.
patent: 2002/0113218 (2002-08-01), Okumura et al.
patent: 2002/0139481 (2002-10-01), Baxter et al.
patent: 2006/0235314 (2006-10-01), Migliuolo et al.
IBM Technical Disclosure Bulletin, Mask/Wafer Locking Device, vol. 21, No. 11, Apr. 1979, DiMilia et al., pp. 4684-4685.
IBM Technical Disclosure Bulletin, Mask Aligning Fixture for Silicon Wafers, vol. 27, No. 4B, Sep. 1984, Christensen et al., pp. 2383-2384.
IBM Technical Disclosure Bulletin, Kinematic Mounts for Mask Alignment, vol. 21, No. 5, Oct. 1978, Huntley et al., pp. 2024-2025.
IBM Technical Disclosure Bulletin, Mask-to-Wafer Alignment, vol. 19, No. 6, Nov. 1976, Wetz, p. 2113.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Mask and substrate alignment for solder bump process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask and substrate alignment for solder bump process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask and substrate alignment for solder bump process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4013391

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.