Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-09-09
1997-05-27
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, 430330, 428432, G03F 900
Patent
active
056331010
ABSTRACT:
An exposure mask formed with a predetermined pattern for exposure on a substrate to be subjected to exposure comprises a glass substrate and a heat conductive film having a thermal conductivity higher than that of the glass substrate, wherein the heat conductive film is so formed as to cover substantially an entire surface of the glass substrate, and the pattern is so formed as to be in contact with the heat conductive film.
REFERENCES:
patent: 4080267 (1978-03-01), Castellani et al.
patent: 4448865 (1984-05-01), Bohlen et al.
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4650983 (1987-03-01), Suwa
patent: 4770531 (1988-09-01), Griesdorn
patent: 5117255 (1992-05-01), Shiraishi et al.
Nikon Corporation
Rosasco S.
LandOfFree
Mask and projection exposure method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask and projection exposure method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask and projection exposure method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2327982