Mask and method of manufacturing the same,...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S007000, C430S022000, C430S023000, C430S322000

Reexamination Certificate

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06875542

ABSTRACT:
A method of manufacturing a mask includes attaching to a first substrate formed with an opening a second substrate formed with a plurality of penetrating holes. The plurality of penetrating holes are disposed inside the opening. The first substrate and the second substrate may be joined together by anode coupling. First and second alignment marks may be used for positioning the second substrate and the first substrate when attaching the second substrate to the first substrate.

REFERENCES:
patent: 6720236 (2004-04-01), Yotsuya
patent: 20030054646 (2003-03-01), Yotsuya
patent: 20040166652 (2004-08-01), Yotsuya
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patent: A 10-204615 (1998-08-01), None
patent: A 2001-118780 (2001-04-01), None
patent: A 2001-181822 (2001-07-01), None
patent: A 2001-185350 (2001-07-01), None
patent: A 2001-230194 (2001-08-01), None
patent: A 2001-237073 (2001-08-01), None
patent: A 2001-246599 (2001-09-01), None
patent: A 2002-47560 (2002-02-01), None

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