Mask and method of manufacturing liquid crystal display...

Details Mask and method of manufacturing liquid crystal display... Mask and method of manufacturing liquid crystal display...

2007-07-31

2007-07-31

Hoang, Quoc (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S149000, C257SE29151, C257SE51005

Reexamination Certificate

active

11022650

ABSTRACT:
A method for fabricating a device is disclosed. The method includes providing a substrate; forming a thin film on the substrate; forming a photoresistable layer on the thin film; irradiating light onto the photoresistable layer through a photo mask having a transmissive region, a semi-transmissive region, a diffractive region and an interceptive region, and developing the photoresistable layer to form a photoresist pattern having at least three different thicknesses. With the above-described process, a liquid crystal display device (LCD), for example, can be manufactured using three photo masks.

REFERENCES:
patent: 6057065 (2000-05-01), Rolson
patent: 6534246 (2003-03-01), Bae
patent: 6586286 (2003-07-01), Park et al.
patent: 2002/0021403 (2002-02-01), Kim et al.

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