Mask and method of forming a mask for avoiding side lobe problem

Details Mask and method of forming a mask for avoiding side lobe problem Mask and method of forming a mask for avoiding side lobe problem

1998-12-14

2000-06-20

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060776331

ABSTRACT:
A mask and method of forming a mask for forming a closely spaced array of contact holes and larger isolated holes in an integrated circuit wafer. The mask provides a binary mask section for the formation of the closely spaced array of contact holes where the depth of focus is not a problem thereby avoiding problems due to side lobe effect. The mask also provides a ring type attenuating phase shifting mask for the formation of isolated larger holes where improved depth of focus is required, thereby also avoiding the problems due to side lobe effect in this region.

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patent: 5716738 (1998-02-01), Garza
patent: 5882827 (1999-03-01), Nakao
P. Rai-Chadhury, "Handbook of Microlithography, Micromachining and Microfabrication, vol. I: Microlithography", SPIE Press, 1997, p74-82.

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