Mask and method for using the mask in lithographic processing

Details Mask and method for using the mask in lithographic processing Mask and method for using the mask in lithographic processing

2006-04-18

2006-04-18

Ho, Tu-Tu (Department: 2818)

Active solid-state devices (e.g., transistors, solid-state diode

Alignment marks

C257S283000, C257SE23179

Reexamination Certificate

active

07030506

ABSTRACT:
A method and mask to improve measurement of alignment marks is disclosed. An exemplary embodiment of the invention includes a resist mask with a patterned alignment mark comprising an assemblage of features whose spacing is smaller than the wavelength of light used to measure the alignment. In a preferred embodiment, an alignment mark patterning process alters the appearance of the alignment mark and renders an enhanced contrast with the substrate background.

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patent: 2005/0041256 (2005-02-01), Kreuzer
patent: 0 727 715 (1996-08-01), None
patent: 1 162 507 (2001-12-01), None

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