Mask and method for producing thereof and a semiconductor...

Details Mask and method for producing thereof and a semiconductor... Mask and method for producing thereof and a semiconductor...

2003-12-18

2008-03-18

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07344805

ABSTRACT:
A mask is provided wherein the mask has: a plate-like member having a mask pattern area and at least one pn junction; and a current supplying area which supplies a current to the pn junction, and a Peltier effect is caused by supplying a current to the pn junction, thereby enabling the temperature of the mask pattern area to be controlled. When this mask is used, reliable formation of an ion implanted region is enabled without forming a resist pattern.

REFERENCES:
patent: 6098408 (2000-08-01), Levinson et al.
patent: 6727109 (2004-04-01), Ju et al.
patent: 6800933 (2004-10-01), Mathews et al.
patent: 6806006 (2004-10-01), Lercel et al.
patent: 5-226579 (1993-09-01), None
patent: 9-205058 (1997-08-01), None
patent: 2002-203806 (2002-07-01), None

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