Mask and mask frame assembly for evaporation

Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...

Reexamination Certificate

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Details

C118S504000, C118S721000, C118S505000, C204S298110, C438S531000, C438S551000, C438S552000, C438S553000, C438S671000, C438S717000, C216S012000, C216S041000, C216S045000, C216S047000, C216S048000, C216S049000, C216S050000

Reexamination Certificate

active

06955726

ABSTRACT:
A mask frame assembly includes a frame having an opening and a mask having at least two unit mask elements. Both ends of each unit mask element are fixed to the frame in a state of tension. The unit mask elements include a unit masking pattern, and overlap each other on a predetermined width to form a single mask pattern block. Each unit mask element has a recessed wall in an overlapping portion thereof so as to maintain the thickness of the mask constant at an overlap between the unit mask elements. Accordingly, the mask frame assembly reduces distortion in an evaporation pattern due to an increase in the size of a mask pattern, facilitates the adjustment of a total pitch of evaporation patterns, and prevents evaporation from occurring at undesired positions.

REFERENCES:
patent: 4167413 (1979-09-01), Christ et al.
patent: 4511599 (1985-04-01), Rustomji
patent: 4615781 (1986-10-01), Boudreau
patent: 4715940 (1987-12-01), Boudreau
patent: 4780382 (1988-10-01), Stengl et al.
patent: 5260151 (1993-11-01), Berger et al.
patent: 5567267 (1996-10-01), Kazama et al.
patent: 6177218 (2001-01-01), Felker et al.
patent: 6475287 (2002-11-01), Clark
patent: 6749690 (2004-06-01), Clark
patent: 6858086 (2005-02-01), Kang
patent: 2003/0101932 (2003-06-01), Kang
patent: 2003/0221613 (2003-12-01), Kang et al.
patent: 2004/0104197 (2004-06-01), Shigemura et al.
patent: 2004/0115342 (2004-06-01), Shigemura
patent: 2004/0123799 (2004-07-01), Clark
patent: 1998-71583 (1998-10-01), None
patent: 2000-60589 (2000-10-01), None

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