Mask and manufacturing method thereof and exposure method

Details Mask and manufacturing method thereof and exposure method Mask and manufacturing method thereof and exposure method

2008-07-15

2008-07-15

Rosasco, S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

07399558

ABSTRACT:
A mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern with formations smaller than those of the desired pattern are arrayed is illuminated, and the light which passed through the mask onto a member to be exposed is projected via a projection optical system, said method comprising a selecting step for selecting one of the following three supplementary patterns, a first supplementary pattern wherein said supplementary pattern is disposed at a position where a line extending in the vertical direction as to the pitch direction from a certain desired pattern hole of said desired pattern, and a line connecting the supplementary pattern hole closest to said certain desired pattern hole in the vertical direction with said certain desired pattern hole, intersect at an angle of 0°, a second supplementary pattern wherein said angle is 0° or more but less than 45°, and a third supplementary pattern wherein said supplementary pattern supplementary pattern is disposed at a position where said is disposed at a position where said angle is 45°.

REFERENCES:
patent: 6150059 (2000-11-01), Tanabe et al.
patent: 7214453 (2007-05-01), Yamazoe et al.

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