Mask and manufacturing method thereof

Details Mask and manufacturing method thereof Mask and manufacturing method thereof

2007-12-18

2010-06-01

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C524S434000

Reexamination Certificate

active

07727684

ABSTRACT:
A blank mask is provided. The blank mask includes a mask layer disposed on a transparent quartz substrate, and a nano inorganic material-polymer complex layer. The nano inorganic material-polymer complex layer has nano-scale components and is formed on a surface of the mask layer to adsorb a residual contamination source remaining on the surface of the mask layer and to protect the surface of the mask layer from external contamination sources. The nano inorganic material-polymer complex layer can include a nano clay-polymer composite where PVDF is interposed between the nano clay plate-shaped layers. The contamination sources can be removed from the mask layer surface by removing the composite layer.

REFERENCES:
patent: 7094503 (2006-08-01), Ray et al.
patent: 2001/0044077 (2001-11-01), Tan
patent: 2004/0019143 (2004-01-01), Koloski et al.
patent: 2006/0155035 (2006-07-01), Metzemacher et al.
patent: 2007/0012189 (2007-01-01), Kang et al.
patent: 10-2005-0123264 (2005-12-01), None
patent: 10-2006-0069602 (2006-06-01), None
patent: WO 2006/105273 (2006-10-01), None

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