Mask and its manufacturing method, exposure, and device...

Details Mask and its manufacturing method, exposure, and device... Mask and its manufacturing method, exposure, and device...

2007-05-08

2007-05-08

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10783218

ABSTRACT:
A mask arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern so that where a virtual lattice is assumed which has a lattice point located at a center of the predetermined pattern, a center of the auxiliary pattern is offset from the lattice point of the virtual lattice.

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Hur et al., “Effect of pattern density for contact windows in an attenuated phase shift mask”, Proc. SPIE vol. 2440, 1995, pp. 278-289.
Singapore Patent Office Letter dated Feb. 1, 2006 forwarding Australian Patent Office Search Report and Written Opinion dated Dec. 21, 2005.

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