Mask and charged particle beam exposure method using the mask

Details Mask and charged particle beam exposure method using the mask Mask and charged particle beam exposure method using the mask

1992-06-10

1993-10-26

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2505051, H01J 37302

Patent

active

052568814

ABSTRACT:
A transmission mask is used when exposing patterns by a charged particle beam which passes therethrough. The transmission mask includes a plate, and a plurality of rectangular blocks formed on a surface of the plate and having an area approximately equal to a cross sectional area of the charged particle beam irradiated thereon, where the blocks include a first block in which at least one transmission hole is provided and a second block in which no transmission hole is provided. The transmission of the first block is partly irradiated by the charged particle beam when varying the size of the exposing pattern. A single second block is provided immediately adjacent to at least two first blocks, so that an irradiating position of the charged particle beam can be varied with respect to both the two first blocks from the single second block.

REFERENCES:
patent: 4914304 (1990-04-01), Koyama
patent: 5036209 (1991-07-01), Kataoka et al.

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