Mask alignment for semiconductor processing

Details Mask alignment for semiconductor processing Mask alignment for semiconductor processing

1980-10-29

1982-02-16

Punter, William H.

Optics: measuring and testing

By alignment in lateral direction

350 63, 350 81, 355 76, G01B 1100, G03B 2764

Patent

active

043156924

ABSTRACT:
A high power microscope is fitted with a gas jet arrangement for blowing a thin flexible mask into local contact with a semiconductor substrate so as to facilitate mask alignment.

REFERENCES:
patent: 3310356 (1967-03-01), Borberg
patent: 3321265 (1967-05-01), Clave et al.
patent: 3538754 (1970-11-01), Grolman et al.
patent: 3626141 (1971-12-01), Daly
patent: 3955163 (1976-05-01), Novak
patent: 4026653 (1977-05-01), Appelbaum et al.
patent: 4122335 (1978-10-01), Sullivan
patent: 4270838 (1981-06-01), Furusawa et al.
Klein et al., "Mask Support & Clamp Structure", IBM Tech. Disc. Bull., 10-1970, pp. 1304-1305.

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