Mask aligner having a photo-mask setting device

Details Mask aligner having a photo-mask setting device Mask aligner having a photo-mask setting device

1983-11-09

1987-04-07

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

046555994

ABSTRACT:
A mask aligner includes a photo-mask having a plurality of first marks used to align the photo-mask with a wafer and a plurality of second marks used to align the photo-mask with the mask aligner, the number of the second marks being equal to that of the first marks; a wafer having a plurality of third marks associated with the first marks; a mark providing section having a plurality of fourth marks associated with the second marks; and a detector for detecting an error in alignment between the first and third marks and also an error in alignment between the second and fourth marks, the detector including a plurality of sensors for sensing various marks in different positions, a basic form produced when the first and third marks are placed one above another being substantially the same as that produced when the second and fourth marks are placed one above another.

REFERENCES:
patent: 4052603 (1977-10-01), Karlson
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4167677 (1979-09-01), Suzki
patent: 4262208 (1981-04-01), Suzki et al.
patent: 4418467 (1983-12-01), Iwai
patent: 4435070 (1984-03-01), Kitajima
patent: 4469442 (1984-09-01), Reich

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