Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2004-07-09
2008-12-16
Connolly, Patrick J (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
07466413
ABSTRACT:
A mask pattern for imaging a marker structure on a substrate with a lithographic apparatus, the marker structure being configured to determine optical alignment or overlay, includes constituent parts to define the marker structure. The constituent parts include a plurality of segments, each segment having substantially a size of a device feature and a segment shape. The mask pattern includes at least one assist feature located at a critical part of the segment shape. The at least one assist feature has substantially a size below a resolution of the lithographic projection and is configured to counteract optical aberrations or optical limitations generated in the lithographic projection at the critical part.
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Translation of Japanese Office Action issued in Japanese Application No. 2004-202539 dated Jul. 10, 2007.
Colina Luis Alberto Colina Santamaria
Dusa Mircea
Finders Jozef Maria
Hendrickx Eric Henri Jan
Van Der Hoff Alexander Hendrikus Martinus
ASML Netherlands B.V.
Connolly Patrick J
Pillsbury Winthrop Shaw & Pittman LLP
Richey Scott M
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