Manufacturing process of shadow mask and shadow mask plate there

Details Manufacturing process of shadow mask and shadow mask plate there Manufacturing process of shadow mask and shadow mask plate there

1991-08-22

1993-01-19

Rowan, Kurt C.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

445 47, 313402, 72363, H01J 914, H01J 2906

Patent

active

051803224

ABSTRACT:
A process of manufacturing a shadow mask includes the steps of preparing a plurality of metal plates having a surface deviation characterized in that its Rsk value is not more than 0.3 .mu.m, preferably less than 0, its Sm value is not less than 60 .mu.m, and its Pc value relative to the band of 1 .mu.m width centered about the center line of a roughness profile is not more than 60/cm, forming a plurality of apertures in each of the plates, registrating and piling up the plates upon each other, annealing the plates piled upon each other, and pressing and molding the annealed metal plates into a predetermined curvature. Each of the metal plates preferably has Ra in the range from 0.1 to 0.7 .mu.m.

REFERENCES:
patent: 4427396 (1984-01-01), Van Den Berg
patent: 4478589 (1984-10-01), Takenaka et al.
patent: 4482334 (1984-11-01), Ohtake et al.
Patent Abstracts of Japan; vol. 1, No. 47 (E-76)(2948) May 9, 1977; and JP-A-51 142 970 (Hitachi Seisakusyo K.K.) Dec. 8, 1976, *abstract*.
Patent Abstracts of Japan; vol. 9, No. 111 (M-379)(1834) May 15, 1985; and JP-A-59 232 607 (Touyou Kouhan K.K.) Dec. 27, 1984, *abstract*.
Patent Abstracts of Japan; vol. 10, No. 192 (E-147)(2248) Jul. 5, 1986 and JP-A-61 039 345 (Toshiba Corp.) Feb. 25, 1986 *abstract*.
Patent Abstracts of Japan; vol. 12, No. 139 (C-491)(2986) Apr. 27, 1988 and JP-A-62 253 783 (Nippon Mining Co., Ltd.) Nov. 5, 1987 *abstract*.
"Surface Texture Parameters with Talysurf 6".

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