Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2006-01-03
2006-01-03
Mulpuri, Savitri (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S458000, C438S057000
Reexamination Certificate
active
06982181
ABSTRACT:
To obtain a high intensity, high definition and sophisticated electrooptic display device unit such as transmissive type LCD, a semi-transmissive type LCD, a reflective type LCD, a surface emitter type organic EL, or an underside emitter type organic EL, etc. which has high electron and positive hole mobility and low leak electric current qualities.A porous semiconductor layer (low porous Si layer11a/high porous Si layer11b/low porous Si layer11c), a monocrystalline Si layer12a, and the Si O2layer13aare formed on a monocrystalline Si substrate10. The Si O2layer13aof the peripheral circuit area is removed, leaving the Si O2layer13ain the display area. The poly Si layer14ais formed in the display area by semiconductor epitaxial growth, and a monocrystalline Si layer12bis formed in the peripheral circuit area. Then, the display element section is formed in the poly Si layer14of the display area and the peripheral circuitry section is formed in the monocrystalline Si layer12bof the peripheral circuit area. The assembly is divided into each ultra slim electrooptic display device unit after separation from the backing, and after the process of separating the Si substrate10from the porous Si layer11band by attaching the backing to the ultra slim electrooptic display element substrate after its separation. Each ultra slim electrooptic display device unit is divided after attaching the backing.
REFERENCES:
patent: 6891578 (2005-05-01), Yonehara et al.
patent: 2001/0019371 (2001-09-01), Zavracky et al.
patent: 2003/0008437 (2003-01-01), Inoue et al.
patent: 2003/0087503 (2003-05-01), Sakaguchi et al.
patent: 2003/0136966 (2003-07-01), Inoue et al.
patent: 2004/0219762 (2004-11-01), Shimoda et al.
patent: 2005/0059219 (2005-03-01), Tayanaka
patent: 2005/0095810 (2005-05-01), Nakata et al.
patent: 09-312349 (1997-02-01), None
Depke Robert J.
Mulpuri Savitri
Sony Corporation
Trexler, Bushnell, Giangiorgi, Blackstone & Marr
LandOfFree
Manufacturing process for ultra slim electrooptic display... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Manufacturing process for ultra slim electrooptic display..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing process for ultra slim electrooptic display... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3568683