Manufacturing methods and apparatuses of an optical device...

Coating processes – Optical element produced

Reexamination Certificate

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C427S264000, C427S270000, C427S271000, C427S277000, C427S278000, C427S355000, C427S374100, C427S375000, C427S385500, C264S001100, C264S001700, C264S001900

Reexamination Certificate

active

07018674

ABSTRACT:
A method for manufacturing an optical device is disclosed. The method includes coating a substrate with a resin thin layer, wherein temperature of the resin thin layer is controlled lower than a polymerization reaction starting temperature thereof and the resin is not substantially polymerized, heating the resin thin layer to a temperature higher than polymerization reaction starting temperature and glass-transition temperature but lower than a thermal decomposition starting temperature of the resin so that the resin thin layer is polymerized on the substrate to form a resin thin film thereon, pressing a stamp having an inverted micro-asperity pattern against the resin thin film such that a micro-asperity pattern is formed on a surface of the resin thin film; cooling the resin thin film to a temperature lower than the glass-transition temperature; and separating the stamp from the resin thin film.

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Patent Abstracts of Japan, Publication No. 04-296820, Publication date Oct. 21, 1992, 2 pages.
Patent Abstracts of Japan, Publication No. 05-080335, Publication date Apr. 2, 1993, 3 pages.

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