Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-01-04
2011-01-04
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C204S192120
Reexamination Certificate
active
07862960
ABSTRACT:
There are provided a manufacturing method of a transparent substrate for a mask blank, a mask blank, or an exposure mask adapted to prevent occurrence of a transfer pattern defect or a mask pattern defect, by correcting a recessed defect existing on the surface of the transparent substrate, and a defect correction method of an exposure mask.With respect to an exposure mask having a transparent substrate1formed thereon with a mask pattern2which becomes a transfer pattern, correction is performed by removing, by the use of a needle-shaped member4, a peripheral portion of a recessed defect3formed on a surface1aof the substrate, where the mask pattern2is not formed, so as to induce a reduction in transmission light quantity which causes a transfer pattern defect, thereby reducing a level difference between the surface of the substrate and the depth of the recessed defect. This correction of the recessed defect is carried out at the stage before forming a mask pattern forming thin film on the transparent substrate. A mask blank and an exposure mask are manufactured by the use of the transparent substrate applied with the correction of the recessed defect.
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Korean Office Action, mailed Jul. 4, 2009.
Japanese Office Action corresponding to Japanese Patent Application No. 2005-181456, dated Jun. 8, 2010.
Mitsui Masaru
Tanabe Masaru
Fraser Stewart A
Hoya Corporation
Huff Mark F
Sughrue & Mion, PLLC
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