Manufacturing method of semiconductor device using multiple...

Details Manufacturing method of semiconductor device using multiple... Manufacturing method of semiconductor device using multiple...

2011-01-11

2011-01-11

Louie, Wai-Sing (Department: 2814)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

C438S024000, C438S029000, C438S045000, C438S048000, C257SE31038

Reexamination Certificate

active

07867791

ABSTRACT:
The invention provides a technique to manufacture a highly reliable semiconductor device and a display device at high yield. As an exposure mask, an exposure mask provided with a diffraction grating pattern or an auxiliary pattern formed of a semi-transmissive film with a light intensity reducing function is used. With such an exposure mask, various light exposures can be more accurately controlled, which enables a resist to be processed into a more accurate shape. Therefore, when such a mask layer is used, the conductive film and the insulating film can be processed in the same step into different shapes in accordance with desired performances. As a result, thin film transistors with different characteristics, wires in different sizes and shapes, and the like can be manufactured without increasing the number of steps.

REFERENCES:
patent: 5589707 (1996-12-01), Cronin
patent: 6020598 (2000-02-01), Yamazaki
patent: 2002/0011597 (2002-01-01), Fujimoto et al.
patent: 2002/0013020 (2002-01-01), Kim et al.
patent: 2003/0020065 (2003-01-01), Honda
patent: 2002-203862 (2002-07-01), None

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