Manufacturing method of semiconductor device and...

Active solid-state devices (e.g. – transistors – solid-state diode – Organic semiconductor material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S260000, C438S082000

Reexamination Certificate

active

07825407

ABSTRACT:
A method of manufacturing a semiconductor device includes steps of forming a gate electrode over a light-transmitting substrate, forming a gate insulating layer containing an inorganic material over the gate electrode and the substrate, forming an organic layer containing a photopolymerizable reactive group over the gate insulating layer, polymerizing selectively the organic layer by irradiating the organic layer with light from back side of the substrate, using the gate electrode as a mask, forming an organic polymer layer by removing a residue of the organic layer, being other than polymerized, forming an organosilane film including a hydrolytic group over the gate insulating layer in a region other than a region in which the organic polymer layer is formed, forming source and drain electrodes by applying a composition containing a conductive material over the organic polymer layer, and forming a semiconductor layer over the gate electrode, the source and drain electrodes.

REFERENCES:
patent: 5696011 (1997-12-01), Yamazaki et al.
patent: 5852488 (1998-12-01), Takemura
patent: 6337731 (2002-01-01), Takemura
patent: 6399257 (2002-06-01), Shirota et al.
patent: 2003/0038912 (2003-02-01), Broer et al.
patent: 2004/0214381 (2004-10-01), Ohta
patent: 2005/0196710 (2005-09-01), Shiroguchi
patent: 2005/0221203 (2005-10-01), Fujii
patent: 2000-133636 (2000-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing method of semiconductor device and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing method of semiconductor device and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method of semiconductor device and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4244425

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.