Manufacturing method of photomask and photomask

Details Manufacturing method of photomask and photomask Manufacturing method of photomask and photomask

2005-01-25

2005-01-25

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C430S296000, C430S321000, C356S393000, C356S394000

Reexamination Certificate

active

06846598

ABSTRACT:
In order to shorten the time required to change or correct a mask pattern over a mask, light-shielding patterns formed of a resist film for integrated circuit pattern transfer are partly provided over a mask substrate constituting a photomask in addition to light-shielding patterns formed of a metal for the integrated circuit pattern transfer.

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