Radiation imagery chemistry: process – composition – or product th – Effecting frontal radiation modification during exposure,...
Reexamination Certificate
2008-01-22
2008-01-22
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Effecting frontal radiation modification during exposure,...
C134S001000
Reexamination Certificate
active
11527031
ABSTRACT:
A main object of the present invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a target pattern form with high precision. To achieve the object, the invention provides a manufacturing method of a plurality of pattern formed bodies, comprising a pattern forming step and a foreign matter removing step, wherein the pattern forming step is a step of radiating vacuum-ultraviolet light through a photomask to a pattern forming substrate, varying a surface property by the vacuum-ultraviolet light, and forming a property varied pattern with the property varied on a surface of the pattern forming substrate to form a pattern formed body; the pattern forming step is repeated plural times to manufacture a plurality of the pattern formed bodies; and the foreign matter removing step is a step performed between the repeated pattern forming steps and of radiating vacuum-ultraviolet light from the same light source as used in the pattern forming step to the photomask, in a state where the photomask and the pattern forming substrate are not opposed to each other, to remove a foreign matter deposited onto the photomask.
REFERENCES:
patent: 2001/0026355 (2001-10-01), Aoki et al.
patent: 2001-324816 (2001-11-01), None
Kobayashi Hironori
Sawada Takashi
Yamashita Kaori
Dai Nippon Printing Co. Ltd.
Ladas & Parry LLP
McPherson John A.
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