Manufacturing method of microlens of CMOS image sensor

Details Manufacturing method of microlens of CMOS image sensor Manufacturing method of microlens of CMOS image sensor

2011-07-12

2011-07-12

Richards, N Drew (Department: 2895)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

Reexamination Certificate

active

07977142

ABSTRACT:
A method of manufacturing an image sensor having a minimized spatial distance between microlenses to improve integration, and thus, enhance the ability of each microlens to condense light incident.

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Viana, C.E. “TEOS Silicon Oxides Deposition to Low Temperature Applications” Abs. 1005, 206th Meeting, 2004 The Electrochemical Society pp. 1.

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