Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of coating supply or source outside of primary...
Patent
1994-10-18
1996-08-27
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of coating supply or source outside of primary...
427128, 427131, 427132, 427251, 4272553, 427294, 427404, 4274192, 427585, B05D 306
Patent
active
055499368
ABSTRACT:
In a manufacturing method of a magnetic recording medium with a vacuum deposition, two shielding members are provided above a substrate for defining an aperture. An evaporation source is located at a position wherein evaporated atoms from an evaporation material can adhere to a moving substrate through the aperture. The substrate is moved while a material in the evaporation source is irradiated at two evaporation portions with two electron beams along a moving direction of the substrate to form a magnetic layer. Thus, curving of columnar gains formed in the magnetic layer is suppressed or crystal orientation is enhanced, and magnetic read/write characteristics are improved. Further, a productivity is improved because the aperture can be enlarged than previously by using the two evaporation portions.
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English Abstract of Japanese Patent Publication No. 59-022235, Feb. 4, 1984.
Sugita, "Co-Cr Perpendicular Magnetic Recording Tape by Vacuum Deposition"; IEEE Transactions On Magnetics, vol. 20, No. 5, Sep. 1984, pp. 687-692.
Ishida Tatsuaki
Sugita Ryuji
Tohma Kiyokazu
Yoshimoto Kazunari
Matsushita Electric - Industrial Co., Ltd.
Pianalto Bernard
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