Manufacturing method of CMOS transistor including heat treatment

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 41, 437 42, 437 44, 437 56, 437176, 148DIG147, 257369, 257371, H01L 21265

Patent

active

054478723

ABSTRACT:
Gate electrodes of an N-channel transistor and a P-channel transistor are formed on a semiconductor substrate with a gate insulator therebetween. After conducting a first thermal treatment to the gate electrodes, N-type heavily doped diffusion layers to be a source or a drain of the N-channel transistor are formed using the gate electrode of the N-channel transistor as a mask. After conducting a second thermal treatment to the N-type heavily doped diffusion layers at a lower temperature than that of the first thermal treatment, P-type heavily doped diffusion layers to be a source or a drain of the P-channel transistor are formed using the gate electrode of the P-channel transistor as a mask. Then, a third thermal treatment is conducted to the P-type heavily doped diffusion layers at a lower temperature than that of the second thermal treatment.

REFERENCES:
patent: 4886764 (1989-12-01), Miller et al.
patent: 4997782 (1991-03-01), Bergonzoni
patent: 5006477 (1991-04-01), Farb
patent: 5166087 (1992-11-01), Kakimoto et al.
patent: 5217923 (1993-06-01), Suguro
patent: 5234850 (1993-08-01), Liao
patent: 5316977 (1994-05-01), Kunishima et al.
patent: 5320975 (1994-06-01), Cederbaum et al.
patent: 5352631 (1994-10-01), Sitaram et al.
patent: 5385857 (1995-01-01), Solo de Zorldivar

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing method of CMOS transistor including heat treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing method of CMOS transistor including heat treatment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method of CMOS transistor including heat treatment will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-472400

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.