Manufacturing method of CMOS transistor including heat treatment

Details Manufacturing method of CMOS transistor including heat treatment Manufacturing method of CMOS transistor including heat treatment

1994-11-14

1995-09-05

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437 41, 437 42, 437 44, 437 56, 437176, 148DIG147, 257369, 257371, H01L 21265

Patent

active

054478723

ABSTRACT:
Gate electrodes of an N-channel transistor and a P-channel transistor are formed on a semiconductor substrate with a gate insulator therebetween. After conducting a first thermal treatment to the gate electrodes, N-type heavily doped diffusion layers to be a source or a drain of the N-channel transistor are formed using the gate electrode of the N-channel transistor as a mask. After conducting a second thermal treatment to the N-type heavily doped diffusion layers at a lower temperature than that of the first thermal treatment, P-type heavily doped diffusion layers to be a source or a drain of the P-channel transistor are formed using the gate electrode of the P-channel transistor as a mask. Then, a third thermal treatment is conducted to the P-type heavily doped diffusion layers at a lower temperature than that of the second thermal treatment.

REFERENCES:
patent: 4886764 (1989-12-01), Miller et al.
patent: 4997782 (1991-03-01), Bergonzoni
patent: 5006477 (1991-04-01), Farb
patent: 5166087 (1992-11-01), Kakimoto et al.
patent: 5217923 (1993-06-01), Suguro
patent: 5234850 (1993-08-01), Liao
patent: 5316977 (1994-05-01), Kunishima et al.
patent: 5320975 (1994-06-01), Cederbaum et al.
patent: 5352631 (1994-10-01), Sitaram et al.
patent: 5385857 (1995-01-01), Solo de Zorldivar

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