Manufacturing method of CMOS transistor in which heat treatment

Details Manufacturing method of CMOS transistor in which heat treatment Manufacturing method of CMOS transistor in which heat treatment

1993-10-27

1995-04-25

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437 44, 437 57, 437247, 257338, 257351, H01L 21265

Patent

active

054098475

ABSTRACT:
Gate electrodes of an N-channel transistor and a P-channel transistor are formed on a semiconductor substrate with a gate insulator therebetween. After conducting a first thermal treatment to the gate electrodes, N-type heavily doped diffusion layers to be a source or a drain of the N-channel transistor are formed using the gate electrode of the N-channel transistor as a mask. After conducting a second thermal treatment to the N-type heavily doped diffusion layers at a lower temperature than that of the first thermal treatment, P-type heavily doped diffusion layers to be a source or a drain of the P-channel transistor are formed using the gate electrode of the P-channel transistor as a mask. Then, a third thermal treatment is conducted to the P-type heavily doped diffusion layers at a lower temperature than that of the second thermal treatment.

REFERENCES:
patent: 4530150 (1985-07-01), Shirato
patent: 4553315 (1985-11-01), McCarty
patent: 4642878 (1987-02-01), Maeda
patent: 4764477 (1988-08-01), Chang et al.
patent: 4891326 (1990-01-01), Koyanagi
patent: 4956311 (1990-09-01), Liou et al.
patent: 4978626 (1990-12-01), Poon et al.
patent: 5093276 (1992-03-01), Asahina
patent: 5141890 (1992-08-01), Haken
patent: 5166087 (1992-11-01), Kakimoto et al.
patent: 5270233 (1993-12-01), Hamatake

Affiliated with

Also associated with

Rating

Manufacturing method of CMOS transistor in which heat treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing method of CMOS transistor in which heat treatment , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method of CMOS transistor in which heat treatment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1567231