Manufacturing method including near-field optical microscopic ex

Details Manufacturing method including near-field optical microscopic ex Manufacturing method including near-field optical microscopic ex

1997-08-20

1999-04-13

Evans, F. L.

Optics: measuring and testing

By polarized light examination

With light attenuation

356128, G01B 1100

Patent

active

058943498

ABSTRACT:
A system for analyzing a sample is disclosed. The system includes a light-transmitting probe with a light emitting tip having a diameter that is less than one-wavelength of light. The system is adapted to place the probe in close proximity to the sample without physically contacting the sample with the probe, and to move the sample relative to the probe such that light transmitted from the probe is directed onto the desired portion of the sample surface. The system further include a light source which transmits light into the probe tip. The system also includes a detector which detects a portion of the light transmitted through the sample. The detector is configured to detect that portion of the light that was incident on the sample surface at an angle greater than the critical angle. The detector is equipped with an aperture through which passes substantially all of the light that was incident on the surface at an angle less than the critical angle and which was transmitted through the sample. The system further analyzes the light received by the detector to determine the relative index of refraction of a material at one point on the surface of the sample relative to the index of refraction of the material at another point on the surface of the sample.

REFERENCES:
patent: 5362585 (1994-11-01), Adams
patent: 5656182 (1997-08-01), Marchmann et al.
Schiavone et al, Microelectronic Engineering, 30, 1996, pp. 571-574.

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