Manufacturing method for waveguide-type optical components

Optical waveguides – Planar optical waveguide – Thin film optical waveguide

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385142, 65 311, 65 315, 65 31, 65 608, G02B 610

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052915751

ABSTRACT:
A method for manufacturing waveguide-type optical components featuring a lower propagation loss at low cost in which a lower clad section (2) made of silica glass is formed on a substrate (1), and an antistatic layer and a mask layer having a desired pattern are formed on the surface of the lower clad section (2) in the order they are listed. Then, an electron beam is irradiated from above the mask layer to produce a core (6) of the desired pattern in the lower clad section (2), the mask layer and the antistatic layer are removed to expose the surface of the lower clad section (2), and an upper clad section (7) having a lower refractive index than the core (6) is formed on the exposed surface of the lower clad section (2), thus producing an optical component. The surface of the whole optical component is at a distance from the core; therefore, the scattering loss caused by minute irregularities on the surface of the optical component is reduced.

REFERENCES:
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patent: 5178658 (1993-01-01), Tumminelli et al.
Optical Channel Waveguide Fabrication Based on Electron Beam Irradiation of Silica by S. J. Madden et al; Applied Physics Letters, vol. 57, No. 27; Dec. 31, 1990; pp. 2902-2903.
Waveguide Fabrication for Integrated Optics by Electron Beam Irradiation of Silicia by D. Barbier et al; Journal of Lightwave Technology, vol. 9, No. 6; Jun. 1991.
Patent Abstracts of Japan, vol. 9, No. 116 (P-357) (1839) & JP-A-60 002 906 (Nippon Denshin Denwa Kosha), Jan. 9, 1985, *Abstract.
Patent Abstracts of Japan, vol. 11, No. 35 (P-542) Feb. 3, 1987 & JP-A-61 204 603 (Hitachi), Sep. 10, 1986, *Abstract.
Patent Abstracts of Japan, vol. 10, No. 202 (P-477) Jul. 15, 1986 & JP-A-61 045 202 (Hitachi), Mar. 3, 1986, *Abstract.

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