Manufacturing method for semiconductor photoelectrochemical...

Semiconductor device manufacturing: process – Having metal oxide or copper sulfide compound semiconductor...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S171000, C438S584000, C438S768000, C257SE21079, C257SE21168

Reexamination Certificate

active

07927914

ABSTRACT:
The invention provides a manufacturing method for a semiconductor photoelectrochemical cell, comprising the steps of burning a base made of titanium or a titanium alloy in an atmosphere of 700° C. to 1000° C. at a rate of temperature increase of no lower than 5° C./second so that a titanium oxide layer is formed on the surface, and thus, mixing titanium metal into said titanium oxide layer.

REFERENCES:
patent: 4511638 (1985-04-01), Sapru et al.
patent: 6344127 (2002-02-01), Itoh
patent: 1340573 (1999-06-01), None
patent: 51-107074 (1976-09-01), None
patent: 58-26623 (1983-02-01), None
patent: 60-12682 (1985-01-01), None
patent: 4082570 (1992-03-01), None
patent: 6-90824 (1994-04-01), None
patent: 9-228022 (1997-09-01), None
patent: 2000219513 (2000-08-01), None
patent: 2000-271493 (2000-10-01), None
patent: 1555753 (1978-05-01), None
Bodyako et al., “Oxidation of the titanium alloy VT9 during rapid heating,” Abstarct, 1983.
Akira Fujishima, et al., Electrochemical Photolysis of Water at a Semiconductor Electrode, Nature, vol. 238, No. 5358, pp. 37-18, Jul. 7, 1972.
T. Sakata, et al., Photochemical Diode Model of Pt/TiO2 Particle and its Photocatalytic Activity, Chemical Physics Letters, vol. 88, No. 1, pp. 50-54, Apr. 23, 1982.
C. Luca, et al., Photoelectrochemical Behaviour of the TiO2 Semiconductor Electrodes Obtained by Thermal Oxidation of the Titanium Foils, Revue Roumaine de Chimie, vol. 39, No. 4, pp. 355-363, 1994.
P.A. Christensen, et al., Observation of an optical phonon band in situ in TiO2 electrochemistry: a possible indicator of strongly trapped intermediates in the O2 evolution reaction, Chemical Physics Letters, vol. 344, No. 5, 6, pp. 488-494, Aug. 31, 2001.
G. Bertand, et al., Morphology of Oxide Scales Formed on Titanium, Oxidation of Metals, vol. 21, Nos. 1-2, Feb. 1984, pp. 1-19, XP002522539.
K. J. Harting, et al., Production and Testing Methods of Different TiO2 Photoanodes, International Journal of Hydrogen Energy, vol. 11, No. 12, Jan. 1, 1986, pp. 773-781, XP025450495.
Taro Toyada, et al., Photoacoustic, photoelectrochemical current, and photoluminescence spectra of highly porous, polycrystalline TiO2 electrodes fabricated by chemical synthesis, Material Science and Engineering B78, Dec. 15, 2000, pp. 84-89, XP004227446.
Office Action issued by Canadian Patent Office on Mar. 2, 2010 for counterpart Canadian Patent Application No. 2,554,913.
Zu, Yan-Ning, et al., A Study of Titanium Dioxide Electrodes for the Photoassisted Electrolysis of Water, The Institute of Photographic Chemistry, Academia Sinica, Jan. 1981, vol. 2.
Leng Wenhua, et al., A Study of Titanium Oxide Film Electrodes Prepared byDirect Thermal Oxidation, I. Preparation, Structure and Electrochemical Properties, Chinese Journal of Chemical Physics, vol. 14, No. 6, Dec. 2001.
Yang Hongjun, et al., Preparation of n-TiO2 Semiconductor Photoanode and Study of Its Photoelectrochemical Behavior, Apr. 1983.
Office Action issued by Taiwanese Patent Office on Nov. 27, 2009 for counterpart Taiwanese Patent Application No. 095122881.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing method for semiconductor photoelectrochemical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing method for semiconductor photoelectrochemical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method for semiconductor photoelectrochemical... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2690026

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.