Manufacturing method for photomask

Details Manufacturing method for photomask Manufacturing method for photomask

2005-05-03

2005-05-03

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000, C430S363000, C430S945000

Reexamination Certificate

active

06887628

ABSTRACT:
A manufacturing method for a photomask includes a step of performing a writing operation at a predetermined scanning unit in a direction in which a head of a writing system is to be scanned (Y direction) and at a predetermined overrun unit in a direction perpendicular to the scanning direction (X direction). A pattern of the photomask includes a cyclic pattern. The writing step includes a step of writing pattern units (e.g., pixel units20) under identical overrun conditions (e.g., a grid head17ais aligned with the left end of each pixel unit20such that writing is commenced from the left end of each pixel unit20), the pattern units including identical cyclic patterns.

REFERENCES:
patent: 5725974 (1998-03-01), Kawahira
patent: 5766802 (1998-06-01), Skinner
patent: 2001-250197 (2000-09-01), None
Technical Report of FPD Intelligence 1999.5.

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