Manufacturing method for microlithography apparatus

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36446801, 364578, G06F 1900

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active

058285733

ABSTRACT:
Methods are disclosed for decreasing the time and expense needed to design, develop, and manufacture a new or modified microlithography exposure apparatus, and for enabling the transfer precision of the various kinetic systems of the apparatus to be accurately estimated before having to actually fabricate and assemble the apparatus. The method comprises generating an overall computer-simulation model of the kinetic system of the apparatus. The model includes characteristic data (e.g., vibration transmission characteristics) of the mechanical assemblies comprising the kinetic system, the mechanical assemblies including the reticle and wafer stages as well as columns for supporting the stages. The model also includes characteristic data of the control system of the kinetic system. The model can be subjected to simulated testing and evaluation to determine the overall transfer precision of the kinetic systems, and improvements can be made to the overall model in response to the results of such testing and evaluation. After the model exhibits conformance to transfer-precision specifications, an actual apparatus according to the model can be built and evaluated.

REFERENCES:
patent: 4890239 (1989-12-01), Ausschnitt et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5655110 (1997-08-01), Krivokapic et al.
patent: 5663076 (1997-09-01), Rostoker et al.
Akutsu et al., "Acceleration Feed-back Control for Positioning Stage," Proceedings of the 68th Regular Conference of the Japan Society of Mechanical Engineering, vol. C, pp. 14-16 (1991).
Bruning, "Optical Imaging for Microfabrication," J. Vac. Sci. Technol. 17:1147-1155 (1980).
Buckley et al., "Step and Scan: A Systems Overview of a New Lithography Tool," SPIE 1088:424-433 (1989).
Lin, "The Paths to Subhalf-Micrometer Optical Lithography," SPIE 922:256-269 (1988).
Sakino et al., "Development of Ultra-Precision Positioning Stage," Proceedings of the 69th Regular Conference of the Japan Society of Mechanical Engineering, vol. C, pp. 11-13 (1992).

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