Manufacturing method for mask for charged-particle-beam transfer

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430296, G03F 900

Patent

active

058768815

ABSTRACT:
Methods are disclosed for manufacturing masks for charged-particle-beam (CPB) or X-ray transfer. The masks have substantially no pattern defects. In a representative method for making stencil masks, the mask is defined using multiple subfields each having a respective pattern of voids. The subfields are separated from each other by boundary regions lacking any pattern features. The boundary regions include supports to provide the mask with physical and thermal stability. The supports are formed by an etching step in which relatively large amounts of substrate are removed. In the methods, the mask pattern is formed, inspected, and "repaired" as required before performing the etching step that forms the supports. Thus, the forming, inspection, and repair steps can be performed before the mask is made too delicate.

REFERENCES:
patent: 5115456 (1992-05-01), Kimura et al.
patent: 5260151 (1993-11-01), Bergerr et al.
patent: 5728492 (1998-03-01), Kawata
Behringer et al., "Repair Techniques for Silicon Transmission Masks Used for Submicron Lithography," J. Vac. Sci. Technol. B4:94-99 (Mar. 1986).
Bohlen et al., "Electron-Beam Proximity Printing-A New High-Speed Lithography Method for Submicron Structures," IBM J. Res. Develop. 26:568-579 (Mar. 1982).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing method for mask for charged-particle-beam transfer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing method for mask for charged-particle-beam transfer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method for mask for charged-particle-beam transfer will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-420950

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.