Semiconductor device manufacturing: process – Semiconductor substrate dicing – By electromagnetic irradiation
Reexamination Certificate
2010-12-15
2011-12-06
Nguyen, Ha Tran T (Department: 2829)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
By electromagnetic irradiation
C438S460000, C438S462000
Reexamination Certificate
active
08071464
ABSTRACT:
A light emitting device manufacturing method including the steps of corrugatedly scanning a laser beam along a plurality of division lines formed on a light emitting device wafer having a sapphire substrate layer and a light emitting layer to apply the laser beam to the sapphire substrate layer, thereby performing laser processing for the sapphire substrate layer and next applying an external force to a processed locus formed along each division line by the above laser processing to thereby divide the light emitting device wafer into a plurality of light emitting devices. The sapphire layer of each light emitting device has side surfaces whose horizontal sectional shape is a corrugated shape. Accordingly, the number of total reflections on the side surfaces of the sapphire layer can be reduced to thereby achieve efficient emergence of light from the sapphire layer.
REFERENCES:
patent: 6902990 (2005-06-01), Gottfried et al.
patent: 2007/0176181 (2007-08-01), Kusunoki
patent: 10-056203 (1998-02-01), None
patent: 10-305420 (1998-11-01), None
patent: 2002-192370 (2002-07-01), None
Dehne Aaron
Disco Corporation
Greer Burns & Crain Ltd.
Nguyen Ha Tran T
LandOfFree
Manufacturing method for light emitting device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Manufacturing method for light emitting device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method for light emitting device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4254188