Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2006-05-16
2006-05-16
Trinh, Michael (Department: 2822)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S149000, C438S155000, C257S059000, C257S072000
Reexamination Certificate
active
07045373
ABSTRACT:
A manufacturing method for an in-plane switching mode liquid crystal display (LCD) unit is provided. The method includes steps of: providing a substrate, forming a first conductive layer on the substrate, patterning the first conductive layer to form a gate line, a comb-shaped first electrode, a wiring pad, and a comb-shaped second electrode by a first photo etching process, forming a first insulation layer and a first semi-conductive layer, patterning the first insulation layer and the first semi-conductive layer to form a channel, an insulation structure, a dielectric layer, and plural crossed-conductive line insulation structures by a second photo etching process, forming a second semi-conductive layer and a second conductive layer on the substrate, patterning the second semi-conductive layer and the second conductive layer to form a source/drain electrode, a data line, a connecting electrode, and a first electrode by a third photo etching process, and forming a passivation layer.
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Hannstar Display Corp.
Haverstock & Owens LLP
Trinh Michael
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