Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal
Reexamination Certificate
2006-06-13
2006-06-13
Nelms, David (Department: 2818)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
C438S057000
Reexamination Certificate
active
07060519
ABSTRACT:
There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substrates before and after chucked on a mask stage of an exposure apparatus, forming a corresponding relation of each mask substrate, the first information and the second information, selecting the second information showing a desired flatness among the second information of the corresponding relation, and preparing another mask substrate having the same surface shape as the surface shape indicated by the first information in the corresponding relation with the selected second information, and forming a desired pattern on the above-mentioned another mask substrate.
REFERENCES:
patent: 4391511 (1983-07-01), Akiyama et al.
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 5565285 (1996-10-01), Takekuma et al.
patent: 5737072 (1998-04-01), Emery et al.
patent: 5801954 (1998-09-01), Le et al.
patent: 5804336 (1998-09-01), Rolfson
patent: 5989760 (1999-11-01), Mangat et al.
patent: 6040096 (2000-03-01), Kakizaki et al.
patent: 6172373 (2001-01-01), Hara et al.
patent: 6316358 (2001-11-01), Shin
patent: 6335791 (2002-01-01), Miyatake
patent: 6537844 (2003-03-01), Itoh
patent: 2-160237 (1990-06-01), None
patent: 02-160347 (1990-06-01), None
patent: 05-241322 (1993-09-01), None
patent: 7-74088 (1995-03-01), None
patent: 11-194479 (1999-07-01), None
patent: 2003-50458 (2003-02-01), None
patent: 2004-46259 (2004-02-01), None
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Nelms David
Nguyen Thinh T
LandOfFree
Manufacturing method for exposure mask, generating method... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Manufacturing method for exposure mask, generating method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method for exposure mask, generating method... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3618597