Manufacturing method for electrooptic device, electrooptic...

Details Manufacturing method for electrooptic device, electrooptic... Manufacturing method for electrooptic device, electrooptic...

2003-10-08

2008-03-04

Nguyen, Dung T. (Department: 2871)

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

C349S114000, C349S187000

Reexamination Certificate

active

07339639

ABSTRACT:
A transflective electrooptic device is provided with an opening formed in a colored layer provided on the reflecting section of a transflective layer. The opening has an elliptical two-dimensional shape, and can be formed, in a patterning process, by a mask pattern having a two-dimensional shape without any corners, such as an elliptical shape. Such an opening makes it possible to inhibit fluctuations in the opening shape and opening area during a patterning operation with respect to the colored layer, and reduces variations in the opening area, thereby increasing the color reproducibility of the reflective display.

REFERENCES:
patent: 6215538 (2001-04-01), Narutaki et al.
patent: 6704075 (2004-03-01), Takizawa et al.
patent: 6885418 (2005-04-01), Matsushita et al.
patent: 6909479 (2005-06-01), Iijima
patent: 2002/0018159 (2002-02-01), Kim et al.
patent: 2002/0171791 (2002-11-01), Anno et al.
patent: 2004/0095528 (2004-05-01), Nakamura et al.
patent: 1387074 (2005-12-01), None
patent: 2000-29012 (2000-01-01), None
patent: 2003-186000 (2002-07-01), None
patent: 2002-229010 (2002-08-01), None

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