Manufacturing method for cascaded junction field effect transist

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437162, 437911, 357 22, H01L 21385, H01L 2980

Patent

active

048001724

ABSTRACT:
A method for manufacturing cascaded junction type field effect transistors comprises the steps of forming an epitaxial layer of a first conductivity type used as a channel region on a semiconductor substrate of a second conductivity type and performing selective oxidation to form a thick oxide film on part of the epitaxial layer. Then, the thick oxide film is removed to provide a part of the surface which is a level lower than the main surface of the epitaxial layer. Next, an impurity of the first conductivity type is doped into the low and high surface areas of the epitaxial layer from the surface thereof to form source and drain regions separated at a preset distance. After this, an impurity of the second conductivity type is doped into the low and high level surface areas of the epitaxial layer between the source and drain regions to simultaneously form first and second junction gates which are separated at a present distance. Then, the semiconductor substrate is connected to the second junction gate and source region to connect two junction FETs in cascade fashion.

REFERENCES:
patent: 4300151 (1981-11-01), Nishizawa
patent: 4346513 (1982-08-01), Nishizawa et al.
patent: 4485392 (1984-11-01), Singer
patent: 4516316 (1985-05-01), Haskell
Patent Abstracts of Japan, vol. 5, No. 125 (E-69) [797], Aug. 12, 1981; JP-A-56 62372 (Hitachi Seisakusho) May 28, 1981.
Patent Abstracts of Japan, vol. 7, No. 264 (E-212) [1409], 11/24/83; JP-A-58 147 176 (Daini Seikosha) Sep. 1, 1983.
Patent Abstracts of Japan, vol. 9, No. 251 (E-348) [1975], 1985; & JP-A-60 101 972 (Matsushita Denki Sangyo) Jun. 6, 1985.
Patent Abstracts of Japan, vol. 4, No. 152 (E-31) [634], 10/24/80; & JP-A-55 102 253 (Nippon Denki) Aug. 5, 1980.
Patent Abstracts of Japan, vol. 3, No. 98 (E-131), Aug. 18, 1979; & JP-A-54 75280 (Nippon Denki) Jun. 15, 1979.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing method for cascaded junction field effect transist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing method for cascaded junction field effect transist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method for cascaded junction field effect transist will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-419678

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.