Manufacturing method for a solid state imaging device

Details Manufacturing method for a solid state imaging device Manufacturing method for a solid state imaging device

1996-08-21

2000-05-23

Fahmy, Wael

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

438 69, 438 70, H01L 2100

Patent

active

060665114

ABSTRACT:
A solid-state imaging device Comprising a photosensing portion for performing opto-electric conversion and a light shielding film formed so as not to cover a photosensing surface of the photosensing portion. An overcoat layer formed of a first transparent material is formed so as to cover the photosensing surface of the photosensing portion, and a recessed portion is formed in the overcoat layer at a position just above the photosensing surface. The recessed portion has a top surface having a concavity toward the photosensing surface. A lens portion formed of a second transparent material having a refractive index higher than that of the first transparent material is embedded in the recessed portion.

REFERENCES:
patent: 5514888 (1996-05-01), Sano et al.
patent: 5585280 (1996-12-01), Kwasnick et al.
patent: 5593913 (1997-01-01), Aoki
patent: 5595930 (1997-01-01), Baek
patent: 5670384 (1997-09-01), Needham

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