Manufacturing apparatus for semiconductor devices

Details Manufacturing apparatus for semiconductor devices Manufacturing apparatus for semiconductor devices

1977-12-09

1979-05-15

Stein, Mervin

Coating apparatus

With cutting, punching or tearing of work

Web or sheet work

427248A, C23C 1300

Patent

active

041541928

ABSTRACT:
An oxidizing tube encircled by an electric heater is disposed within a pressure envelope. A high pressure inert gas is supplied to the envelope and tube while hydrogen and oxygen are supplied to the tube while being kept at an elevated temperature to react with each other to form steam. The steam oxidizes the surfaces of silicon wafers placed in the tube to form silicon dioxide films on them. Alternatively a water evaporator may be disposed within the pressure envelope to directly supply steam to the tube with the high pressure gas aiding the supply of the steam.

REFERENCES:
patent: 3098763 (1963-07-01), Deal et al.
patent: 3645695 (1972-02-01), Koepp et al.
patent: 3742904 (1973-07-01), Bishop
patent: 3837905 (1974-09-01), Hile et al.
patent: 4018184 (1977-04-01), Nagasawa et al.

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