Coating processes – Electrical product produced – Fluorescent or phosphorescent base coating
Reexamination Certificate
2007-02-28
2010-10-26
Meeks, Timothy H (Department: 1715)
Coating processes
Electrical product produced
Fluorescent or phosphorescent base coating
C427S066000, C427S255230, C118S727000
Reexamination Certificate
active
07820231
ABSTRACT:
The present invention provides an evaporation apparatus, which is one type of film formation apparatus and provides superior uniformity in EL layer film thickness, superior throughput, and improved utilization efficiency of EL materials and an evaporation method. The present invention is characterized in that an evaporation source holder, in which a container that encloses an evaporation material is disposed, is moved at a certain pitch with respect to a substrate during evaporation. Further, a film thickness monitor is integrated with the evaporation source holder for the movement. Furthermore, film thickness can be made uniform by adjusting the moving speed of the evaporation source holder in accordance with values measured by the film thickness monitor.
REFERENCES:
patent: 2435997 (1948-02-01), Bennett
patent: 2436997 (1948-02-01), Bennett
patent: 3931490 (1976-01-01), Grothe et al.
patent: 4023523 (1977-05-01), Ing
patent: 4187801 (1980-02-01), Monk
patent: 4627989 (1986-12-01), Feuerstein et al.
patent: 4897290 (1990-01-01), Terasaka et al.
patent: 5258325 (1993-11-01), Spitzer et al.
patent: 5259881 (1993-11-01), Edwards et al.
patent: 5429884 (1995-07-01), Namiki et al.
patent: 5512320 (1996-04-01), Turner et al.
patent: 5703436 (1997-12-01), Forrest et al.
patent: 5817366 (1998-10-01), Arai et al.
patent: 5850071 (1998-12-01), Makiguchi et al.
patent: 5906857 (1999-05-01), McKee et al.
patent: 5943471 (1999-08-01), Atwell
patent: 6011904 (2000-01-01), Mattord
patent: 6132280 (2000-10-01), Tanabe et al.
patent: 6132805 (2000-10-01), Moslehi
patent: 6179923 (2001-01-01), Yamamoto et al.
patent: 6237529 (2001-05-01), Spahn
patent: 6244212 (2001-06-01), Takacs et al.
patent: 6326726 (2001-12-01), Mizutani et al.
patent: 6403392 (2002-06-01), Burrows et al.
patent: 6410168 (2002-06-01), Tamura
patent: 6482752 (2002-11-01), Yamazaki et al.
patent: 6503778 (2003-01-01), Yamauchi et al.
patent: 6558219 (2003-05-01), Burroughes et al.
patent: 6633121 (2003-10-01), Eida et al.
patent: 6641674 (2003-11-01), Peng
patent: 6649210 (2003-11-01), Tokailin et al.
patent: 6656273 (2003-12-01), Toshima et al.
patent: 6770562 (2004-08-01), Yamazaki et al.
patent: 6776880 (2004-08-01), Yamazaki
patent: 6786789 (2004-09-01), Sakai et al.
patent: 6830626 (2004-12-01), Smith
patent: 6952078 (2005-10-01), Guenther
patent: 7210979 (2007-05-01), Sakai et al.
patent: 7462372 (2008-12-01), Konuma et al.
patent: 7482631 (2009-01-01), Yamazaki et al.
patent: 2001/0005021 (2001-06-01), Fukuyama et al.
patent: 2001/0006827 (2001-07-01), Yamazaki et al.
patent: 2001/0009154 (2001-07-01), Nguyen et al.
patent: 2001/0050532 (2001-12-01), Eida et al.
patent: 2002/0009538 (2002-01-01), Arai
patent: 2002/0011205 (2002-01-01), Yamazaki et al.
patent: 2002/0020494 (2002-02-01), Yokogawa et al.
patent: 2002/0076847 (2002-06-01), Yamada et al.
patent: 2002/0179013 (2002-12-01), Kido et al.
patent: 2002/0187265 (2002-12-01), Mori et al.
patent: 2002/0197418 (2002-12-01), Mizukami et al.
patent: 2002/0197760 (2002-12-01), Yamazaki et al.
patent: 2003/0101937 (2003-06-01), Van Slyke et al.
patent: 2003/0162314 (2003-08-01), Yamazaki et al.
patent: 2003/0194484 (2003-10-01), Yamazaki et al.
patent: 2003/0221620 (2003-12-01), Yamazaki
patent: 2004/0031442 (2004-02-01), Yamazaki et al.
patent: 2004/0035360 (2004-02-01), Yamazaki et al.
patent: 2007/0167103 (2007-07-01), Sakai et al.
patent: 2008/0014822 (2008-01-01), Yamazaki et al.
patent: 2009/0155941 (2009-06-01), Konuma et al.
patent: 0 998 170 (2000-05-01), None
patent: 1 071 117 (2001-01-01), None
patent: 1 199 909 (2002-04-01), None
patent: 1 207 557 (2002-05-01), None
patent: 61-284569 (1986-12-01), None
patent: 03-062515 (1991-03-01), None
patent: 06-065722 (1994-03-01), None
patent: 10-041069 (1998-02-01), None
patent: 10-124869 (1998-05-01), None
patent: 11-050232 (1999-02-01), None
patent: 11-229123 (1999-08-01), None
patent: 2000-133446 (2000-05-01), None
patent: 2001-081558 (2001-03-01), None
patent: 2001-093667 (2001-04-01), None
patent: 2001-247959 (2001-09-01), None
patent: 2002-060926 (2002-02-01), None
patent: 2002-158090 (2002-05-01), None
patent: 2002-206163 (2002-07-01), None
patent: 2002-367781 (2002-12-01), None
patent: 2002-002778 (2003-01-01), None
patent: 2003-002778 (2003-01-01), None
patent: 2003-034591 (2003-02-01), None
patent: 2004-35964 (2004-02-01), None
patent: 2002-0025760 (2002-04-01), None
patent: 439144 (2001-06-01), None
patent: 468204 (2001-12-01), None
patent: 492067 (2002-06-01), None
patent: WO 01/44865 (2001-06-01), None
patent: WO 01/72091 (2001-09-01), None
McCabe et al.,Unit Operations of Chemical Engineering, McGraw-Hill Book Co., 1967, pp. 388-396.
Taiwan Office Action (Application No. 92119575; TW6526), dated Sep. 19, 2008) with full English translation.
McCabe et al., Unit Operations of Chemical Engineering, “Radiation Heat Transfer”, McGraw-Hill Book Co., Second Edition (1967), pp. 388-396.
Office Action (Application No. 92119575; TW6526) dated Feb. 27, 2009.
Office Action (Application No. 2003-0050827; KR06526) Dated: Feb. 26, 2010 with English Translation.
Murakami Masakazu
Yamazaki Shunpei
Costellia Jeffrey L.
Lin James
Meeks Timothy H
Nixon & Peabody LLP
Semiconductor Energy Laboratory Co,. Ltd.
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