Manufacturing apparatus

Details Manufacturing apparatus Manufacturing apparatus

2007-05-01

2007-05-01

Lebentritt, Michael (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S029000, C438S082000, C438S099000, C257SE21527

Reexamination Certificate

active

10774432

ABSTRACT:
The purpose of the invention is increasing the efficiency of utilizing an EL material and providing a deposition method and a vapor deposition apparatus which is one of the film formation systems which are excellent in throughput and uniformity in film thickness in forming an EL layer. According to the invention, evaporation is performed by moving or reciprocating an evaporation source holder in which a plurality of containers (crucible) each encapsulating an evaporation material are set only in an X direction while moving a substrate at regular intervals. Further, in the plurality of evaporation source holders, film thickness meters of adjacent evaporation sources are disposed alternately so as to sandwich the movement pathway of the substrate.

REFERENCES:
patent: 2435997 (1948-02-01), Bennett
patent: 3931490 (1976-01-01), Grothe et al.
patent: 4023523 (1977-05-01), Ing
patent: 4187801 (1980-02-01), Monk
patent: 4627989 (1986-12-01), Feuerstein et al.
patent: 4897290 (1990-01-01), Terasaka et al.
patent: 5258325 (1993-11-01), Spitzer et al.
patent: 5429884 (1995-07-01), Namiki et al.
patent: 5817366 (1998-10-01), Arai et al.
patent: 6132280 (2000-10-01), Tanabe et al.
patent: 6179923 (2001-01-01), Yamamoto et al.
patent: 6237529 (2001-05-01), Spahn
patent: 6244212 (2001-06-01), Takacs et al.
patent: 6326726 (2001-12-01), Mizutani et al.
patent: 6403392 (2002-06-01), Burrows et al.
patent: 6482752 (2002-11-01), Yamazaki et al.
patent: 2001/0006827 (2001-07-01), Yamazaki et al.
patent: 2001/0009154 (2001-07-01), Nguyen et al.
patent: 2002/0009538 (2002-01-01), Arai
patent: 2002/0011205 (2002-01-01), Yamazaki et al.
patent: 2002/0024051 (2002-02-01), Yamazaki et al.
patent: 2002/0187567 (2002-12-01), Yamazaki et al.
patent: 2002/0197760 (2002-12-01), Yamazaki et al.
patent: 2003/0162314 (2003-08-01), Yamazaki et al.
patent: 2003/0194484 (2003-10-01), Yamazaki et al.
patent: 2003/0221620 (2003-12-01), Yamazaki
patent: 2004/0031442 (2004-02-01), Yamazaki et al.
patent: 2004/0035360 (2004-02-01), Yamazaki et al.
patent: 2004/0040504 (2004-03-01), Yamazaki et al.
patent: 2004/0123804 (2004-07-01), Yamazaki et al.
patent: 2004/0139914 (2004-07-01), Yamazaki et al.
patent: 54-127877 (1979-10-01), None
patent: 10-041069 (1998-02-01), None
patent: 2001-093667 (2001-04-01), None
patent: 2001-247959 (2001-09-01), None
patent: 2002-060926 (2002-02-01), None
patent: 2004-035964 (2004-02-01), None
patent: WO 01/31081 (2001-05-01), None

Affiliated with

Also associated with

Rating

Manufacturing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3754327