Manufacturing adjustment during article fabrication

Details Manufacturing adjustment during article fabrication Manufacturing adjustment during article fabrication

1993-02-25

1994-02-01

Ruggiero, Joseph

Boots, shoes, and leggings

364148, 364491, 382 14, 395 21, 395904, G06F 1518

Patent

active

052837467

ABSTRACT:
The use of neural networks has been employed to adjust processing during the fabrication of articles. For example, in the production of photolithographic masks by electron beam irradiation of a mask blank in a desired pattern, electrons scattered from the mask substrate cause distortion of the pattern. Adjustment for such scattering is possible during the manufacturing process by employing an adjustment function determined by a neural network whose parameters are established relative to a prototypical mask pattern.

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Monte Carlo Calculation, "Advances in Electronics and Electron Physics," vol. 69, K. Murata and D. F. Kysen,Chapter 11, Monte Carlo Methods and Microlithography Simulation for Electron and X-ray Beams, pp. 175-256, Academic Press, NY, 1987.
Experimental Means, D. J. Hughes, R. F. Rix, "Proximity Correction on an Electron Scan E-beam Machine by Dose Variation", Pub. Microelectronic Eng., vol. 9, 1989, pp. 243-246.

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