Manufacture of trimmable high value polycrystalline silicon resi

Details Manufacture of trimmable high value polycrystalline silicon resi Manufacture of trimmable high value polycrystalline silicon resi

1986-08-08

1987-11-24

Hearn, Brian E.

Fishing, trapping, and vermin destroying

29610R, 148DIG46, 148DIG71, 148DIG94, 148DIG136, 357 51, H01L 21477, H01L 2700, H01L 3100

Patent

active

047079096

ABSTRACT:
A process of providing semi-insulating thin film resistors with closer tolerance values by furnance-annealing the film to increase is resistance to less than the final intended value, and then focused heat source-annealing the film to within a close tolerance of the final intended value.

REFERENCES:
patent: 4309224 (1982-01-01), Shibata
patent: 4467312 (1984-08-01), Komatsu
patent: 4602421 (1986-07-01), Lee et al.
Parisi, "Integrated Resistor Trimming", IBM Tech. Dis. Bulletin, vol. 17, No. 10, Mar. 1975, p. 2878.
Lee et al., "On the Semi-insulating . . . Resistor", Solid-State Electronics, vol. 27, No. 11, pp. 995-1001, 1984.

Affiliated with

Also associated with

Rating

Manufacture of trimmable high value polycrystalline silicon resi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacture of trimmable high value polycrystalline silicon resi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacture of trimmable high value polycrystalline silicon resi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2420757