Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2006-04-11
2006-04-11
Vinh, Lan (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C438S750000, C216S016000, C430S312000
Reexamination Certificate
active
07026254
ABSTRACT:
A precursor that may be imaged by heat is made up of a substrate, for example a copper board, and a composite layer structure composed of two layers. Preferably, the first layer is composed of an aqueous developable polymer mixture containing a photothermal conversion material, which is contiguous to the substrate. The second layer of the composite is composed of one or more non-aqueous soluble polymers, which are soluble or dispersible in a solvent which does not dissolve the first layer. The precursor is exposed with an infrared laser or a thermal print head, and upon aqueous development, the exposed regions are removed, revealing regions of the substrate surface able to be etched or otherwise treated. The second layer may also contain a photothermal conversion material. Alternatively, the composite layer may be free of photothermal conversion material when thermal imaging is carried out using a thermal print head. The precursor may be used, for example, as a mask precursor or electronic part precursor.
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Kitson Anthony Paul
Ray Kevin Barry
Eastman Kodak Company
Vinh Lan
LandOfFree
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