Manufacture of integrated circuits using holographic techniques

Details Manufacture of integrated circuits using holographic techniques Manufacture of integrated circuits using holographic techniques

1989-02-03

1990-10-30

Bovernick, Rodney B.

350 36, 350 369, G03H 120

Patent

active

049664280

ABSTRACT:
Apparatus for the manufacture of integrated circuits using holographic techniques in which a holographic image formed on a first recording medium provided on a glass slab is replayed by being scanned in order to reproduce an image of the holographic image on a second recording medium provided on a silicon slice. The replay source provides a a collimated narrow circular beam or elongated beam which passes normally through a face of the prism, through an index matching liquid located between the prism and the glass slab before being totally internally reflected at the other surface of the glass slab. The collimated replay beam provides control over the effective numerical aperture thus preventing wide angle radiation from degrading the quality of the printed image.

REFERENCES:
patent: 3715482 (1973-02-01), Haines et al.
patent: 4416540 (1983-11-01), Nicholson
patent: 4715670 (1987-12-01), Turukhano
patent: 4857425 (1989-08-01), Phillips
"Submicrometer Holographic Photolithography" by John Brook and Rene Dandliker--Solid State Technology--Nov. '89.

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