Manufacture of improved aqueous alkali metal silicate-alkali met

Compositions – Electrically conductive or emissive compositions – Metal compound containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

252173, 252532, 252535, 252539, 252540, 252546, 252551, 252554, 252558, 252559, 252DIG11, 252DIG15, C10

Patent

active

039533794

ABSTRACT:
Gelation and/or precipitation which normally result from the admixing of alkali metal silicates and alkali metal hydroxyalkyl iminodiacetates in aqueous media at elevated temperatures are prevented by raising the pH of the aqueous solution of alkali metal hydroxyalkyl iminodiacetate to 12.5 or more before admixing with the alkali metal silicate. The process described makes a homogeneous mixture of the components and allows the production of a crutcher mix which does not block lines or spray nozzle orifices in the production of spray dried detergent compositions. The preferred silicate is sodium silicate of an Na.sub.2 O:SiO.sub.2 ratio of 1:2 to 1:2.4, the preferred iminodiacetate is disodium 2-hydroxyethyl iminodiacetate and a preferred compound for adjusting the pH is sodium carbonate, all of which are useful in the production of built non-phosphate heavy duty synthetic organic detergent compositions.

REFERENCES:
patent: 3332880 (1967-07-01), Kessler
patent: 3726797 (1973-04-01), Sundby et al.
patent: 3741911 (1973-06-01), Shane

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacture of improved aqueous alkali metal silicate-alkali met does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacture of improved aqueous alkali metal silicate-alkali met, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacture of improved aqueous alkali metal silicate-alkali met will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2001128

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.