Manufacture of hollow CVD silicon nitride articles

Plastic and nonmetallic article shaping or treating: processes – Gas or vapor deposition of article forming material onto...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427227, 4272552, 427289, B29C 1300

Patent

active

045004838

ABSTRACT:
The process of making an article of chemically vapor deposited silicon nitride on a pattern at high temperature including the use of methane to reduce the grain size of the deposited compound.

REFERENCES:
patent: 3226194 (1965-12-01), Kuntz
patent: 3565674 (1971-02-01), Boland et al.
patent: 4035460 (1977-07-01), Dietz et al.
patent: 4036653 (1977-07-01), Jacobson
patent: 4289801 (1981-09-01), Galasso et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacture of hollow CVD silicon nitride articles does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacture of hollow CVD silicon nitride articles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacture of hollow CVD silicon nitride articles will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-612663

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.